HFCVD Reactors

sp3’s proprietary hot filament chemical vapor deposition reactors allow for the deposition of diamond films across a wide variety of materials.  

The polycrystalline diamond structure can be controlled to produce nanocrystalline or microcrystalline films, from 500 nm to 50 μm thick. 

Streamlined chamber frame and reduced facility footprint. 

Typical coating time: 10-100 hours.